Jane P. Chang, Professor of UCLA, was named a member of Harvard Radcliffe Institute’s 2023–2024 class of fellows, a cohort whose projects contend with the urgent, the beautiful, and the vast: from reckoning with the challenges of climate change to creating digital models of iconic Italian violins to detecting distant galaxies.

A Radcliffe fellowship offers scholars in the humanities, sciences, social sciences, and arts—as well as writers, journalists, and other distinguished professionals—a rare chance to pursue ambitious projects for a full year in a vibrant interdisciplinary setting amid the resources of Harvard. The 2023–2024 fellows represent only 3.3 percent of the many applications that Radcliffe received.

Jane P. Chang is a chemical engineer whose research at UCLA focuses on atomic layer processing of thin film materials. At Radcliffe, she will collaborate with Daniel G. Nocera and his research group to test the feasibility of using atomic layer etching processes to reactivate the catalysts to extend their longevity and efficiency, thereby realizing sustainability in chemical processing.
Chang is among a cadre of fellows who will spend the year at Harvard Radcliffe exploring a large variety of topics across disciplines.

“This year’s cohort promises, once again, to accomplish incredible things,” said Tomiko Brown-Nagin, dean of the Radcliffe Institute for Advanced Study, Daniel P.S. Paul Professor of Constitutional Law at Harvard Law School, and professor of history in the Faculty of Arts and Sciences. “As ever, we have outstanding fellows with expertise in a wide range of fields. Many are grappling with some of the most urgent challenges facing humanity, including seven exemplary scholars working at the forefront of research into climate change and issues of climate justice.”

Prof. Jane Chang received the 2018 Plasma Prize of the AVS Plasma Science and Technology Division. The Plasma Prize is given each year to a researcher who has conducted outstanding research in plasma science and technology. It is the highest honor of AVS PSTD. This was the first time, in award’s history, that a female scientist received this prestigious prize. Jane received the award for “seminal contributions to the fundamental understating and innovative applications of plasma-assisted etching and thin film deposition techniques”.


About Harvard Radcliffe Institute
The Radcliffe Institute for Advanced Study at Harvard University—also known as Harvard Radcliffe Institute—is one of the world’s leading centers for interdisciplinary exploration. We bring students, scholars, artists, and practitioners together to pursue curiosity-driven research, expand human understanding, and grapple with questions that demand insight from across disciplines. For more information, visit www.radcliffe.harvard.edu.