Prof. Jane Chang received the 2018 Plasma Prize of the AVS Plasma Science and Technology Division. The Plasma Prize is given each year to a researcher who has conducted outstanding research in plasma science and technology. It is the highest honor of AVS PSTD.
This was the first time, in the award’s history, that a female scientist received this prestigious prize. Jane received the award for “seminal contributions to the fundamental understanding and innovative applications of plasma-assisted etching and thin film deposition techniques”.